3D Interferometric-Sensors
nXI-5
Microscope interferometer sensor
Ultra-precision, ultra-fast 3D measurement
of thin-film & microstructure
nXI-5 adopts interferometry, a technology used to calibrate precision measuring equipment
and precisely measures small areas. As a result, it delivers reliable data
to increase process efficiency and effectively improve production quality. In addition,
this much faster measuring solution is the right fit for mass production lines and,
its advanced measuring technology ensures high reliability of measurements.
nXI-5 measures step, thickness, and roughness, and hence can use for measuring spots
of 1 ㎛ or less, such as the microstructures, bumps, and roughness of semiconductors,
and the column spacers, surface structures, and protrusions by foreign substances
in displays, etc. In addition, it can separate thin films and so excels
in measuring products with multilayer structures.
Key Features
· Real-time multilayer
(membrane)
separation algorithm
and measurement
· Applicable to the mass production line
· Fast measuring and data acquisition
· High precision
· Simple measurement process
· Various data analysis
· Easy user interface
· Minimum space for installation
Application
Display column space
PCB pattern
Roughness
3D Defect
Specifications
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Measuring model Measuring technology Test content Measuring data
Large-area measurement with WSI interferometers
FOV extensive application
Micro Bump Height
Monolayer membrane thickness measurement
PCB fine pattern
Processed surface roughness measurement
Sensor step-difference measurement
Free-Form Metrology
Divided inspection possible according to product curve angels
Inspection of lens and glass, and measurement of shapes
Inspection of OLED surfaces, and measurement of shapes
Inspection of wafer surfaces, and measurement of shapes
Real-time measurement of transparent and semitransparent product thickness
Applicable to multi-channels
Measurement of wafer(silicone, sapphire) thickness
Measurement of glass and film thickness