3D Interferometric-Sensors
nXR-1
Spectral interferometer sensor
Nanostructure 3D measurement technology
for multi-layer thin-film devices
for multi-layer thin-film devices
The principle of the spectral interference method is to acquire a spectral interference signal by a dispersing element structure and to acquire line profile information about the surface shape of the multi-layered thin-film structure and the thickness of the multi-layered thin-film at once.
In the case of horizontal resolution, it determines by the objective lens's magnification, so it is possible to measure the surface shape of a multilayer thin film with nanometer-level precision while having a higher horizontal resolution than existing Reflectometry & Ellipsometry.
Key Features
· Real-time multi-layer thin film thickness & surface shape measurement
· Applicable to measurement of multi-layer thin film structures such as semiconductors and displays
· Applicable to measurement of multi-layer thin film structures such as semiconductors and displays
· Applicable to the mass production line
· Fast measuring and data acquisition
· High precision
· Fast measuring and data acquisition
· High precision
· Simple measurement process
· Various data analysis
· Easy user interface
· Various data analysis
· Easy user interface
Application
Measurement Result (Multi-layer films)
3D Thickness Information
3D Surface Information
3nd Layer : SiON Layer
2nd Layer : SiO₂ Layer
1st Layer : SiN Layer
Substrate : Si
3D Thickness Profile
Specifications
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